Wideband frequency and in-situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors - Archive ouverte HAL Access content directly
Journal Articles Microelectronic Engineering Year : 2010

Wideband frequency and in-situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors

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C. Bermond
T. Lacrevaz
B. Fléchet
A. Farcy
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hal-00602043 , version 1 (21-06-2011)

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T. Bertaud, C. Bermond, T. Lacrevaz, Corentin Vallée, Y. Morand, et al.. Wideband frequency and in-situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors. Microelectronic Engineering, 2010, 87 (3), pp.301-305. ⟨10.1016/j.mee.2009.06.016⟩. ⟨hal-00602043⟩
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