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Structure: Internal structure identifier : 300016

Grain boundary composition and conduction in HfO2: An ab initio study

K.H. Xue , P. Blaise , L.R.C. Fonseca , G. Molas , E. Vianello et al.
Applied Physics Letters, 2013, 102 (20), pp.201908. ⟨10.1063/1.4807666⟩
Journal articles hal-01017441v1

Physical model of dielectric charging in MEMS

A. Koszewski , Frédéric Souchon , C. Dieppedale , D. Bloch , T. Ouisse et al.
Journal of Micromechanics and Microengineering, 2013, 23 (4), pp.045019;. ⟨10.1088/0960-1317/23/4/045019⟩
Journal articles hal-01067378v1

The structural properties of GaN/AlN core-shell nanocolumn heterostructures

K. Hestroffer , R. Mata , D. Camacho , C. Leclere , G. Tourbot et al.
Nanotechnology, 2010, 21 (41), pp.415702 -415709. ⟨10.1088/0957-4484/21/41/415702⟩
Journal articles istex hal-01067031v1

Anisotropic In distribution in InGaN core-shell nanowires

Cédric Leclere , N. A. Katcho , G. Tourbot , B. Daudin , M. G. Proietti et al.
Journal of Applied Physics, 2014, 116 (1), pp.013517. ⟨10.1063/1.4886756⟩
Journal articles hal-01067036v1
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Diamagnetically trapped arrays of living cells above micromagnets

Paul Kauffmann , Ammara Ith , Daniel O'Brien , Victor Gaude , Florian Boué et al.
Lab on a Chip, 2011, 11 (18), pp.3153-3161. ⟨10.1039/c1lc20232d⟩
Journal articles hal-01067514v1
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Flow property measurement for nanoimprint simulation

Tanguy Lévéder , Stéfan Landis , Laurent Davoust , Nicolas Chaix
Microelectronic Engineering, 2007, 84 (5-8), pp.928-931. ⟨10.1016/j.mee.2007.01.065⟩
Journal articles hal-00266796v1
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Hexagonal faceted SiC nanopillars fabricated by inductively coupled SF$_6$/O$_2$ plasma method

John H Choi , Laurence Latu-Romain , Thierry Baron , Thierry Chevolleau , Edwige Bano et al.
Materials Science Forum, 2012, 717-720, pp.893-896. ⟨10.4028/www.scientific.net/MSF.717-720.893⟩
Journal articles hal-00650069v1
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Etude et caractérisation des films minces lors du procédé de lithographie par nanoimpression

Frederic Lazzarino
Physique [physics]. Université Joseph-Fourier - Grenoble I, 2005. Français. ⟨NNT : ⟩
Theses tel-00128711v1
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Conception, montage et caractérisation d'un interféromètre achromatique pour l'étude de la lithographie à immersion à 193nm

Anne-Laure Charley
Micro et nanotechnologies/Microélectronique. Institut National Polytechnique de Grenoble - INPG, 2006. Français. ⟨NNT : ⟩
Theses tel-00147894v1

Mobility behavior in narrow ­-gate FETs devices

R. Ritzenthaleri C. Dupre X. Mescot O. Faynot T. Ernst J.C. Barbe C. Jahan L. Brevard F. Andrieux S. Deleonibus S. Cristoloveanu , R. Ritzenthaleri , C. Dupre , X. Mescot , O. Faynot et al.
2006 IEEE Int. SOI Conf, 2006, Grenoble, France. pp.XX
Conference papers hal-00146913v1

Détermination expérimentale de la variation de la masse de conductivité des électrons dans un transistor MOS sous contrainte uniaxiale selon [110]

F. Rochette , M. Cassé , M. Mouis , G. Reimbold , F. Boulanger et al.
Journées "Simulation et caractérisation des nanocomposants" du GDR Nanoélectronique, 2006, GRENOBLE, France. pp.XX
Conference papers hal-00148274v1
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Flat-top and patterned-topped cone gratings for visible and mid-infrared antireflective properties

Jean-Baptiste Brueckner , Judikaël Le Rouzo , Ludovic Escoubas , Gerard Berginc , Cecile Gourgon et al.
Optics Express, 2013, 21 (13), pp.16043-16055. ⟨10.1364/OE.21.016043⟩
Journal articles hal-01810798v1

Study of carrier transport in strained and unstrained SOI tri-gate and omega-gate silicon nanowire MOSFETs

M. Koyama , M. Casse , R. Coquand , S. Barraud , C. Vizioz et al.
Solid-State Electronics, 2013, 84, pp.46-52. ⟨10.1016/j.sse.2013.02.024⟩
Journal articles hal-01002176v1

Influence of device architecture on junction leakage in low-temperature process FDSOI MOSFETs

B. Sklenard , P. Batude , Q. Rafhay , I. Martin-Bragado , C.Q. Xu et al.
Solid-State Electronics, 2013, 88, pp.9-14. ⟨10.1016/j.sse.2013.04.018⟩
Journal articles hal-01002090v1

Electrical characterization of memory cell structures using multiple tunnels junctions with embedded Si nanocrystals

D. Deleruyelle , D. Fraboulet , B. de Salvo , N. Buffet , D. Mariolle et al.
Silicon Nano-electronics Workshop 2002, 2002, Honolulu, United States
Conference papers hal-00484534v1

High performance 0.25 µm SiGe and SiGe:C HBT's using non selective epitaxy

H. Baudry , B. Martinet , C. Fellous , O. Kemarrec , Y. Campidelli et al.
ESSDERC 2001, 2001, Ireland
Conference papers hal-00494523v1

CFX kinetics, gas temperature and instabilities in a CF4 inductively coupled discharge

J.P Booth , H. Abada , P. Chabert , G. Cunge
48th National AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers hal-00494528v1

Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Journal of Nanoscience and Nanotechnology, 2008, pp.8, 2 (2008) 535-539
Journal articles hal-00394502v1

Stamp replication for thermal and UV nanoimprint lithography using a UV sensitive silsesquioxane resist

N. Kehagias , V. Reboud , J. de Girolamo , M. Chouiki , M. Zelsmann et al.
Microelectronic Engineering, 2009, pp.86, 4-6 (2009) 776-778
Journal articles hal-00394507v1

A model for cell-substrate mechanosensitivity

A. Nicolas , S.A. Safran
Workshop on cell motility,, 2008, torino, Italy
Conference papers hal-00394511v1

Fabrication of nanoimprinted functionnalized photonic crystals

V. Reboud , N. Kehagias , M. Striccoli , T. Placido , A. Panniello et al.
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication - JNTE 08, Nov 2008, toulouse, France
Conference papers hal-00394544v1

Spontaneous emission of nanocrystals in nanoimprinted photonic structures

V. Reboud , N. Kehagias , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Micro- and Nano-Engineering conference- MNE 2006, Sep 2006, barcelone, Spain
Conference papers hal-00394523v1

2D and 3D polymer photonic devices fabricated by nanoimprint lithography

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Nanosciences & Nanotechnologies conference - NN 08, 2008, thessaloniki, Greece
Conference papers hal-00394540v1

High-resolution fused silica mold fabrication for UV-nanoimprint

P. Voisin , M. Zelsmann , C. Gourgon , J. Boussey-Said
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394551v1

High sensitive and etch-resistant material for UV-nanoimprint

P. Voisin , M. Zelsmann , R. Cluzel , E. Pargon , C. Gourgon et al.
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394552v1

Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

N. Kehagias , G. Chansin , V. Reboud , T. Kehoe , M. Zelsmann et al.
Nanoimprint and Nanoprint Technology conference - NNT 2006, Nov 2006, san francisco, United States
Conference papers hal-00394555v1

Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

M. Chouiki , H. Ridaoui , M. Zelsmann , J. Boussey-Said , J. de Girolamo et al.
Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France
Conference papers hal-00394560v1

Control of Silicon nanocrystals growth for nano-electronics devices

F. Mazen , T. Baron , L. Mollard , J.M Hartmann
203rd meeting of the Electrochemical Society, 2003, paris, France
Conference papers hal-00485167v1

Gate Etching for ULSI Technology : Critical Dimension Control in the sub 0.1 µm regime

X. Detter , L. Vallier , G. Cunge , O. Joubert
AVS, 48th International AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers hal-00486182v1

Detection of defects on EUV lithography mask by dark field microscopy at 13.1 nm

V. Farys , C. Vannuffel , E. Quesnel , V. Muffato , P. Besson et al.
7th International Conference on X-Ray Microscopy, XRM, 2002, grenoble, France
Conference papers hal-00486213v1