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Flow property measurement for nanoimprint simulation

Tanguy Lévéder , Stéfan Landis , Laurent Davoust , Nicolas Chaix
Microelectronic Engineering, 2007, 84 (5-8), pp.928-931. ⟨10.1016/j.mee.2007.01.065⟩
Journal articles hal-00266796v1
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Etude et caractérisation des films minces lors du procédé de lithographie par nanoimpression

Frederic Lazzarino
Physique [physics]. Université Joseph-Fourier - Grenoble I, 2005. Français. ⟨NNT : ⟩
Theses tel-00128711v1
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Conception, montage et caractérisation d'un interféromètre achromatique pour l'étude de la lithographie à immersion à 193nm

Anne-Laure Charley
Micro et nanotechnologies/Microélectronique. Institut National Polytechnique de Grenoble - INPG, 2006. Français. ⟨NNT : ⟩
Theses tel-00147894v1
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Flat-top and patterned-topped cone gratings for visible and mid-infrared antireflective properties

Jean-Baptiste Brueckner , Judikaël Le Rouzo , Ludovic Escoubas , Gerard Berginc , Cecile Gourgon et al.
Optics Express, 2013, 21 (13), pp.16043-16055. ⟨10.1364/OE.21.016043⟩
Journal articles hal-01810798v1

Electrical characterization of memory cell structures using multiple tunnels junctions with embedded Si nanocrystals

D. Deleruyelle , D. Fraboulet , B. de Salvo , N. Buffet , D. Mariolle et al.
Silicon Nano-electronics Workshop 2002, 2002, Honolulu, United States
Conference papers hal-00484534v1

High performance 0.25 µm SiGe and SiGe:C HBT's using non selective epitaxy

H. Baudry , B. Martinet , C. Fellous , O. Kemarrec , Y. Campidelli et al.
ESSDERC 2001, 2001, Ireland
Conference papers hal-00494523v1

CFX kinetics, gas temperature and instabilities in a CF4 inductively coupled discharge

J.P Booth , H. Abada , P. Chabert , G. Cunge
48th National AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers hal-00494528v1

Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Journal of Nanoscience and Nanotechnology, 2008, pp.8, 2 (2008) 535-539
Journal articles hal-00394502v1

Stamp replication for thermal and UV nanoimprint lithography using a UV sensitive silsesquioxane resist

N. Kehagias , V. Reboud , J. de Girolamo , M. Chouiki , M. Zelsmann et al.
Microelectronic Engineering, 2009, pp.86, 4-6 (2009) 776-778
Journal articles hal-00394507v1

A model for cell-substrate mechanosensitivity

A. Nicolas , S.A. Safran
Workshop on cell motility,, 2008, torino, Italy
Conference papers hal-00394511v1

Fabrication of nanoimprinted functionnalized photonic crystals

V. Reboud , N. Kehagias , M. Striccoli , T. Placido , A. Panniello et al.
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication - JNTE 08, Nov 2008, toulouse, France
Conference papers hal-00394544v1

Spontaneous emission of nanocrystals in nanoimprinted photonic structures

V. Reboud , N. Kehagias , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Micro- and Nano-Engineering conference- MNE 2006, Sep 2006, barcelone, Spain
Conference papers hal-00394523v1

2D and 3D polymer photonic devices fabricated by nanoimprint lithography

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra et al.
Nanosciences & Nanotechnologies conference - NN 08, 2008, thessaloniki, Greece
Conference papers hal-00394540v1

High-resolution fused silica mold fabrication for UV-nanoimprint

P. Voisin , M. Zelsmann , C. Gourgon , J. Boussey-Said
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394551v1

High sensitive and etch-resistant material for UV-nanoimprint

P. Voisin , M. Zelsmann , R. Cluzel , E. Pargon , C. Gourgon et al.
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394552v1

Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

N. Kehagias , G. Chansin , V. Reboud , T. Kehoe , M. Zelsmann et al.
Nanoimprint and Nanoprint Technology conference - NNT 2006, Nov 2006, san francisco, United States
Conference papers hal-00394555v1

Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

M. Chouiki , H. Ridaoui , M. Zelsmann , J. Boussey-Said , J. de Girolamo et al.
Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France
Conference papers hal-00394560v1

Control of Silicon nanocrystals growth for nano-electronics devices

F. Mazen , T. Baron , L. Mollard , J.M Hartmann
203rd meeting of the Electrochemical Society, 2003, paris, France
Conference papers hal-00485167v1

Gate Etching for ULSI Technology : Critical Dimension Control in the sub 0.1 µm regime

X. Detter , L. Vallier , G. Cunge , O. Joubert
AVS, 48th International AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers hal-00486182v1

Detection of defects on EUV lithography mask by dark field microscopy at 13.1 nm

V. Farys , C. Vannuffel , E. Quesnel , V. Muffato , P. Besson et al.
7th International Conference on X-Ray Microscopy, XRM, 2002, grenoble, France
Conference papers hal-00486213v1

Influence of dots size and dots number fluctuations on the electrical characteristics of multi nanocrystal memory devices

L. Perniola , B. de Salvo , T. Baron , G. Ghibaudo , S. Lombardo et al.
WODIM 2002, 2002, Grenoble, France
Conference papers hal-00486141v1

Amorphous barium titanate films deposited by RF magnetron sputtering: influence of the oxygen/argon mixing ratio on the electrical properties

F. El Kamel , P. Gonon
Proc.Electroceramics X, 2006, tolede, Spain
Conference papers hal-00394704v1

Dielectric properties of an epoxy/silver nanocomposite for embedded capacitors

A. Boudefel , P. Gonon , M. Nemamcha
Proc.15th European Microelectronics and Packaging Conference (EMPC 2005), 2005, bruges, Belgium
Conference papers hal-00394710v1

Plasma-wall interaction studies during gate etch processes

G. Cunge , M. Kogelschatz , N. Sadeghi , L. Vallier , O. Joubert et al.
AVS, 49th International AVS Symposium & Topical Conferences, 2002, Denver, United States
Conference papers hal-00486306v1

Effect of nitrogen addition on the properties of C:F thin films deposited by RF sputtering

P. Gonon
European Physical Journal: Applied Physics, 2005, pp.32, 15
Journal articles hal-00394679v1

Study of the transit time limitations of the impuse response in HgCdTe avalanche photodiodes

G. Perrais , S. Derelle , L. Mollard , Jp. Chamonal , G. Destefanis et al.
Journal of Electronic Materials, 2009, pp.38, 8 (2009) 1790-1799
Journal articles hal-00463065v1

Resist transformation under low-k dielectric plasma paterning processes : impact on the process control

E. Pargon , N. Posseme , O. Joubert , L. Vallier
203rd meeting of the Electrochemical Society (ECS),, 2003, France. pp.2003
Conference papers hal-00384234v1

Broad-Band and time-resolved absorption spectroscopy with UV-LEDs : application to etching plasma monitoring

G. Cunge , D. Vempaire , M. Touzeau , N. Sadeghi
Applied Physics Letters, 2007, pp.91, 231503
Journal articles hal-00384286v1

Comparison of monomer and polymer resists in thermal nanoimprint lithography

M. Zelsmann , C. Gourgon , J. Boussey-Said
Electron, Ion, Photon Beam Technology and Nanofabrication, 2008, portland, United States
Conference papers hal-00387423v1

On the degradation of anti-sticking layers during nanoimprint lithography

R. Galand , D. Boutry , A. Beaurain , A. Francone , B. Pelissier et al.
International Conference on Nanoimprint and Nanoprint technology NNT08, 2008, kyoto, Japan
Conference papers hal-00387429v1