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Flow property measurement for nanoimprint simulation
Tanguy Lévéder
,
Stéfan Landis
,
Laurent Davoust
,
Nicolas Chaix
Journal articles
hal-00266796v1
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Etude et caractérisation des films minces lors du procédé de lithographie par nanoimpression
Frederic Lazzarino
Physique [physics]. Université Joseph-Fourier - Grenoble I, 2005. Français. ⟨NNT : ⟩
Theses
tel-00128711v1
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Conception, montage et caractérisation d'un interféromètre achromatique pour l'étude de la lithographie à immersion à 193nm
Anne-Laure Charley
Micro et nanotechnologies/Microélectronique. Institut National Polytechnique de Grenoble - INPG, 2006. Français. ⟨NNT : ⟩
Theses
tel-00147894v1
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Flat-top and patterned-topped cone gratings for visible and mid-infrared antireflective properties
Jean-Baptiste Brueckner
,
Judikaël Le Rouzo
,
Ludovic Escoubas
,
Gerard Berginc
,
Cecile Gourgon
et al.
Journal articles
hal-01810798v1
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Electrical characterization of memory cell structures using multiple tunnels junctions with embedded Si nanocrystals
D. Deleruyelle
,
D. Fraboulet
,
B. de Salvo
,
N. Buffet
,
D. Mariolle
et al.
Silicon Nano-electronics Workshop 2002, 2002, Honolulu, United States
Conference papers
hal-00484534v1
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High performance 0.25 µm SiGe and SiGe:C HBT's using non selective epitaxy
H. Baudry
,
B. Martinet
,
C. Fellous
,
O. Kemarrec
,
Y. Campidelli
et al.
ESSDERC 2001, 2001, Ireland
Conference papers
hal-00494523v1
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CFX kinetics, gas temperature and instabilities in a CF4 inductively coupled discharge
J.P Booth
,
H. Abada
,
P. Chabert
,
G. Cunge
48th National AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers
hal-00494528v1
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Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals
N. Kehagias
,
V. Reboud
,
M. Zelsmann
,
M. Striccoli
,
M. Tamborra
et al.
Journal of Nanoscience and Nanotechnology, 2008, pp.8, 2 (2008) 535-539
Journal articles
hal-00394502v1
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Stamp replication for thermal and UV nanoimprint lithography using a UV sensitive silsesquioxane resist
N. Kehagias
,
V. Reboud
,
J. de Girolamo
,
M. Chouiki
,
M. Zelsmann
et al.
Microelectronic Engineering, 2009, pp.86, 4-6 (2009) 776-778
Journal articles
hal-00394507v1
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A model for cell-substrate mechanosensitivity
A. Nicolas
,
S.A. Safran
Workshop on cell motility,, 2008, torino, Italy
Conference papers
hal-00394511v1
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Fabrication of nanoimprinted functionnalized photonic crystals
V. Reboud
,
N. Kehagias
,
M. Striccoli
,
T. Placido
,
A. Panniello
et al.
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication - JNTE 08, Nov 2008, toulouse, France
Conference papers
hal-00394544v1
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Spontaneous emission of nanocrystals in nanoimprinted photonic structures
V. Reboud
,
N. Kehagias
,
M. Zelsmann
,
M. Striccoli
,
M. Tamborra
et al.
Micro- and Nano-Engineering conference- MNE 2006, Sep 2006, barcelone, Spain
Conference papers
hal-00394523v1
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2D and 3D polymer photonic devices fabricated by nanoimprint lithography
N. Kehagias
,
V. Reboud
,
M. Zelsmann
,
M. Striccoli
,
M. Tamborra
et al.
Nanosciences & Nanotechnologies conference - NN 08, 2008, thessaloniki, Greece
Conference papers
hal-00394540v1
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High-resolution fused silica mold fabrication for UV-nanoimprint
P. Voisin
,
M. Zelsmann
,
C. Gourgon
,
J. Boussey-Said
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers
hal-00394551v1
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High sensitive and etch-resistant material for UV-nanoimprint
P. Voisin
,
M. Zelsmann
,
R. Cluzel
,
E. Pargon
,
C. Gourgon
et al.
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers
hal-00394552v1
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Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography
N. Kehagias
,
G. Chansin
,
V. Reboud
,
T. Kehoe
,
M. Zelsmann
et al.
Nanoimprint and Nanoprint Technology conference - NNT 2006, Nov 2006, san francisco, United States
Conference papers
hal-00394555v1
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Low-k epoxy silsesquioxane resists for UV nanoimprint lithography
M. Chouiki
,
H. Ridaoui
,
M. Zelsmann
,
J. Boussey-Said
,
J. de Girolamo
et al.
Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France
Conference papers
hal-00394560v1
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Control of Silicon nanocrystals growth for nano-electronics devices
F. Mazen
,
T. Baron
,
L. Mollard
,
J.M Hartmann
203rd meeting of the Electrochemical Society, 2003, paris, France
Conference papers
hal-00485167v1
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Gate Etching for ULSI Technology : Critical Dimension Control in the sub 0.1 µm regime
X. Detter
,
L. Vallier
,
G. Cunge
,
O. Joubert
AVS, 48th International AVS symposium & Topical conferences, 2001, San Francisco, United States
Conference papers
hal-00486182v1
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Detection of defects on EUV lithography mask by dark field microscopy at 13.1 nm
V. Farys
,
C. Vannuffel
,
E. Quesnel
,
V. Muffato
,
P. Besson
et al.
7th International Conference on X-Ray Microscopy, XRM, 2002, grenoble, France
Conference papers
hal-00486213v1
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Influence of dots size and dots number fluctuations on the electrical characteristics of multi nanocrystal memory devices
L. Perniola
,
B. de Salvo
,
T. Baron
,
G. Ghibaudo
,
S. Lombardo
et al.
WODIM 2002, 2002, Grenoble, France
Conference papers
hal-00486141v1
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Amorphous barium titanate films deposited by RF magnetron sputtering: influence of the oxygen/argon mixing ratio on the electrical properties
F. El Kamel
,
P. Gonon
Proc.Electroceramics X, 2006, tolede, Spain
Conference papers
hal-00394704v1
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Dielectric properties of an epoxy/silver nanocomposite for embedded capacitors
A. Boudefel
,
P. Gonon
,
M. Nemamcha
Proc.15th European Microelectronics and Packaging Conference (EMPC 2005), 2005, bruges, Belgium
Conference papers
hal-00394710v1
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Plasma-wall interaction studies during gate etch processes
G. Cunge
,
M. Kogelschatz
,
N. Sadeghi
,
L. Vallier
,
O. Joubert
et al.
AVS, 49th International AVS Symposium & Topical Conferences, 2002, Denver, United States
Conference papers
hal-00486306v1
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Effect of nitrogen addition on the properties of C:F thin films deposited by RF sputtering
P. Gonon
European Physical Journal: Applied Physics, 2005, pp.32, 15
Journal articles
hal-00394679v1
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Study of the transit time limitations of the impuse response in HgCdTe avalanche photodiodes
G. Perrais
,
S. Derelle
,
L. Mollard
,
Jp. Chamonal
,
G. Destefanis
et al.
Journal of Electronic Materials, 2009, pp.38, 8 (2009) 1790-1799
Journal articles
hal-00463065v1
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Resist transformation under low-k dielectric plasma paterning processes : impact on the process control
E. Pargon
,
N. Posseme
,
O. Joubert
,
L. Vallier
203rd meeting of the Electrochemical Society (ECS),, 2003, France. pp.2003
Conference papers
hal-00384234v1
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Broad-Band and time-resolved absorption spectroscopy with UV-LEDs : application to etching plasma monitoring
G. Cunge
,
D. Vempaire
,
M. Touzeau
,
N. Sadeghi
Applied Physics Letters, 2007, pp.91, 231503
Journal articles
hal-00384286v1
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Comparison of monomer and polymer resists in thermal nanoimprint lithography
M. Zelsmann
,
C. Gourgon
,
J. Boussey-Said
Electron, Ion, Photon Beam Technology and Nanofabrication, 2008, portland, United States
Conference papers
hal-00387423v1
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On the degradation of anti-sticking layers during nanoimprint lithography
R. Galand
,
D. Boutry
,
A. Beaurain
,
A. Francone
,
B. Pelissier
et al.
International Conference on Nanoimprint and Nanoprint technology NNT08, 2008, kyoto, Japan
Conference papers
hal-00387429v1
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