Journal Articles
Microelectronic Engineering
Year : 2010
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https://hal.science/hal-00602043
Submitted on : Tuesday, June 21, 2011-1:55:12 PM
Last modification on : Tuesday, February 15, 2022-3:36:11 AM
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T. Bertaud, C. Bermond, T. Lacrevaz, Corentin Vallée, Y. Morand, et al.. Wideband frequency and in-situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors. Microelectronic Engineering, 2010, 87 (3), pp.301-305. ⟨10.1016/j.mee.2009.06.016⟩. ⟨hal-00602043⟩
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