Journal Articles
Journal of Vacuum Science & Technology A
Year : 2004
Catherine Dubourdieu : Connect in order to contact the contributor
https://hal.science/hal-00135411
Submitted on : Wednesday, March 7, 2007-4:20:29 PM
Last modification on : Saturday, November 26, 2022-5:18:08 PM
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C. Durand, Corentin Vallée, C. Dubourdieu, E. Gautier, M. Bonvalot, et al.. Interface formation during the yttrium oxide deposition on Si by pulsed liquid-injection plasma enhanced metal organic chemical vapor deposition. Journal of Vacuum Science & Technology A, 2004, 22(6), pp.2490-2499. ⟨10.1116/1.1810163⟩. ⟨hal-00135411⟩
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