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Communication Dans Un Congrès Année : 2008

Impact on wafer to wafer repeatability of cleaning/coating strategies in a 300mm ICP plasma reactor

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hal-00400652 , version 1 (01-07-2009)

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  • HAL Id : hal-00400652 , version 1

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L. Babaud, P. Gouraud, O. Joubert, E. Pargon. Impact on wafer to wafer repeatability of cleaning/coating strategies in a 300mm ICP plasma reactor. 55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States. ⟨hal-00400652⟩
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