STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances - Archive ouverte HAL Access content directly
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STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances

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hal-00444370 , version 1 (06-01-2010)

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  • HAL Id : hal-00444370 , version 1

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Jeremy Pereira, Hao Jiang, Laurianne E. Pichon, Remi Dussart, Corinne Y. Duluard, et al.. STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances. Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium. ⟨hal-00444370⟩
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