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Article Dans Une Revue Surface and Coatings Technology Année : 2008

Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering

J. Tranchant
Pierre-Yves Tessier
P.O. Renault
  • Fonction : Auteur
B. Girault
P. Goudeau
  • Fonction : Auteur

Dates et versions

hal-00396504 , version 1 (18-06-2009)

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J. Tranchant, Pierre-Yves Tessier, J.P. Landesman, M. A. Djouadi, Benoit Angleraud, et al.. Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering. Surface and Coatings Technology, 2008, 202 (11), pp.2247. ⟨10.1016/j.surfcoat.2007.07.030⟩. ⟨hal-00396504⟩
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