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https://hal.science/hal-00486337
Submitted on : Tuesday, May 25, 2010-3:29:05 PM
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- HAL Id : hal-00486337 , version 1
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C. Durand, B. Pelissier, Corentin Vallée, M. Bonvalot, L. Vallier, et al.. Pulsed Injection Plasma Enhanced MOCVD of high k Y2O3 layers for gate dielectric Application. 49th International AVS Symposium & Topical Conferences, 2002, Denver, United States. ⟨hal-00486337⟩
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