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Conference Papers Year : 2007

Demolding strategy to improve the hot embossing throughput

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Abstract

Hot embossing throughput is a key issue, which has been addressed in this paper. We show how it is possible to remove the mold from the imprinted resist at the imprint temperature. We study reflow behavior of imprinted patterns, and make a cooling and quenching simulation. This work can lead to design of cooling tools adapted to a given application, and suits as well for the full wafer imprint, as well for the roll imprint.
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Dates and versions

hal-00266799 , version 1 (08-01-2020)

Licence

Attribution - CC BY 4.0

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Tanguy Lévéder, Stéfan Landis, Laurent Davoust, Sébastien Soulan, Nicolas Chaix. Demolding strategy to improve the hot embossing throughput. SPIE 6517 Advanced Lithography, 2007, San Jose, United States. ⟨10.1117/12.711151⟩. ⟨hal-00266799⟩
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