Limits and interest of a low surface temperature for plasma etching processes - Archive ouverte HAL
Communication Dans Un Congrès Année : 2024

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hal-04674902 , version 1 (21-08-2024)

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  • HAL Id : hal-04674902 , version 1

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Christophe Cardinaud, Felipe Cemin, Aurélie Girard, Gaëlle Antoun, Thomas Tillocher, et al.. Limits and interest of a low surface temperature for plasma etching processes. Plasma Etch and Strip for Microelectronics - Plasma Cryoetching Processes, Jun 2024, Louvain (Leuven), Belgium. ⟨hal-04674902⟩
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