Reactive gas pulsing sputtering process, a promising technique to elaborate silicon oxynitride multilayer nanometric antireflective coatings
Résumé
Structural and ellipsometric study on tailored optical properties of tantalum oxynitride films deposited by reactive sputtering Angélique Bousquet, Fadi Zoubian, Joël Cellier et al.
Domaines
Chimie-Physique [physics.chem-ph]Origine | Fichiers produits par l'(les) auteur(s) |
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