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Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?

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hal-04072312 , version 1 (18-04-2023)

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  • HAL Id : hal-04072312 , version 1

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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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