Article Dans Une Revue Applied Surface Science Année : 2018

Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering

Résumé

Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy:H) at 400 °C by sputtering a silicon target under CH4 and N2 reactive gas mixture. Rutherford backscattering spectrometry revealed that the change of reactive gases flow rate (the ratio R = FN2/(FN2+FCH4)) induced a smooth chemical composition tunability from a silicon carbide-like film for R = 0 to a silicon nitride-like one at R = 1 with a large area of silicon carbonitrides between the two regions. The deconvolution of Fourier Transform InfraRed and X-ray photoelectron spectroscopy spectrum highlighted a shift of the chemical environment of the deposited films corresponding to the changes seen by RBS. The consequence of these observations is that a control of refractive index in the range of [1.9–2.5] at λ = 633 nm and optical bandgap in the range [2 eV–3.8 eV] have been obtained which induces that these coatings can be used as antireflective coatings in silicon photovoltaic cells.

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Dates et versions

hal-01774950 , version 1 (24-04-2018)

Identifiants

Citer

A. Bachar, A. Bousquet, H. Mehdi, G. Monier, C. Robert-Goumet, et al.. Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, 2018, 444, pp.293 - 302. ⟨10.1016/j.apsusc.2018.03.040⟩. ⟨hal-01774950⟩
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