Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering - Archive ouverte HAL Access content directly
Journal Articles Applied Surface Science Year : 2018

Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering

A. Bousquet
H. Mehdi
G. Monier
C. Robert-Goumet
M. Belmahi

Abstract

Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy:H) at 400 °C by sputtering a silicon target under CH4 and N2 reactive gas mixture. Rutherford backscattering spectrometry revealed that the change of reactive gases flow rate (the ratio R = FN2/(FN2+FCH4)) induced a smooth chemical composition tunability from a silicon carbide-like film for R = 0 to a silicon nitride-like one at R = 1 with a large area of silicon carbonitrides between the two regions. The deconvolution of Fourier Transform InfraRed and X-ray photoelectron spectroscopy spectrum highlighted a shift of the chemical environment of the deposited films corresponding to the changes seen by RBS. The consequence of these observations is that a control of refractive index in the range of [1.9–2.5] at λ = 633 nm and optical bandgap in the range [2 eV–3.8 eV] have been obtained which induces that these coatings can be used as antireflective coatings in silicon photovoltaic cells.
No file

Dates and versions

hal-01774950 , version 1 (24-04-2018)

Identifiers

Cite

A. Bachar, A. Bousquet, H. Mehdi, G. Monier, C. Robert-Goumet, et al.. Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, 2018, 444, pp.293 - 302. ⟨10.1016/j.apsusc.2018.03.040⟩. ⟨hal-01774950⟩
121 View
0 Download

Altmetric

Share

Gmail Mastodon Facebook X LinkedIn More