Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physics: Conference Series Année : 2013

Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range

Résumé

This paper presents a study of B4C/Mo2C multilayers mirrors with the aim of using it in the achievement of Alternate MultiLayer (AML) grating. Such component allows a high efficiency in the 500-2500 eV energy range for the DEIMOS beamline. Multilayers were deposited on silicon substrate. They are characterized by reflectometry under grazing incidence. Numerical adjustments were performed with a model of two layers in the period without any interfacial. A prototype of AML grating was fabricated and characterized. The efficiency of the first order of diffraction was worth 15% at 1700 eV.
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hal-01702269 , version 1 (02-02-2023)

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Fadi Choueikani, Franck Delmotte, François Bridou, Bruno Lagarde, Pascal Mercère, et al.. Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range. Journal of Physics: Conference Series, 2013, 425 (15), ⟨10.1088/1742-6596/425/15/152007⟩. ⟨hal-01702269⟩
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