Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range
Résumé
This paper presents a study of B4C/Mo2C multilayers mirrors with the aim of using it in the achievement of Alternate MultiLayer (AML) grating. Such component allows a high efficiency in the 500-2500 eV energy range for the DEIMOS beamline. Multilayers were deposited on silicon substrate. They are characterized by reflectometry under grazing incidence. Numerical adjustments were performed with a model of two layers in the period without any interfacial. A prototype of AML grating was fabricated and characterized. The efficiency of the first order of diffraction was worth 15% at 1700 eV.
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Choueikani_2013_J._Phys.%3A_Conf._Ser._425_152007.pdf (846.54 Ko)
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