Influence of process parameters and thermal treatment on the properties of high k oxides grown using atomic layer deposition for resistive RAM applications - Archive ouverte HAL Access content directly
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Influence of process parameters and thermal treatment on the properties of high k oxides grown using atomic layer deposition for resistive RAM applications

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hal-00669526 , version 1 (13-02-2012)

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  • HAL Id : hal-00669526 , version 1

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A. Salaün, H. Grampeix, V. Beugin, C. Mannequin, P. Gonon, et al.. Influence of process parameters and thermal treatment on the properties of high k oxides grown using atomic layer deposition for resistive RAM applications. MAM 2012, Mar 2012, Grenoble, France. ⟨hal-00669526⟩
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