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https://hal.science/hal-00669526
Submitted on : Monday, February 13, 2012-2:06:52 PM
Last modification on : Wednesday, November 17, 2021-4:38:36 PM
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- HAL Id : hal-00669526 , version 1
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A. Salaün, H. Grampeix, V. Beugin, C. Mannequin, P. Gonon, et al.. Influence of process parameters and thermal treatment on the properties of high k oxides grown using atomic layer deposition for resistive RAM applications. MAM 2012, Mar 2012, Grenoble, France. ⟨hal-00669526⟩
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