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3D nanofabrication by reverse contact UV nanoimprint lithography

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Abstract

A newly developed nanofabrication technique, namely reverse contact UV nanoimprint lithography, which is a combination of nanoimprint lithography and contact printing lithography is carried out to fabricate the multilayered polymer structures with sub-micrometer features. This method results in resist pattern transfer without a residual layer thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional (3D) patterning.
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Dates and versions

hal-00394539 , version 1 (11-10-2022)

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N. Kehagias, V. Reboud, G. Chansin, M. Zelsmann, C. Jeppesen, et al.. 3D nanofabrication by reverse contact UV nanoimprint lithography. MNC 2007 - International Microprocesses and Nanotechnology Conference, Nov 2007, Kyoto, Japan. pp.408-409, ⟨10.1109/IMNC.2007.4456277⟩. ⟨hal-00394539⟩
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