Secondary Electron Imaging by Means of a Microfabricated Electron Column
Résumé
This letter reports about the application of a miniaturized electron microscope for generating scanning secondary-electron images. The employed electrostatic lens-system was fabricated using silicon microfabrication techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of better than 100 nm at a beam energy of 200 eV was achieved.
Domaines
Articles anciensOrigine | Accord explicite pour ce dépôt |
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