Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Thickness - Archive ouverte HAL
Article Dans Une Revue Journal of The Electrochemical Society Année : 2024

Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Thickness

Résumé

Vanadium nitride is a highly promising material for micro-pseudocapacitors when used as a bifunctional thin film, i.e. an electrode material and a current collector, owing to its remarkable electrical and electrochemical properties. However, the specific limitations associated with high-rate cycling remain unclear. In this study, we evaluate how the characteristic time associated with charge/discharge of vanadium nitride films is modified with the film thicknesses using electrochemical impedance spectroscopy and cyclic voltammetry measurements coupled to a semi-empirical model commonly utilized to assess the high-rate behaviour of battery electrodes. Both methodologies are in good agreement and revealed that rate capability of this bi-functional material is limited by the VN electrical conductivity. To confirm this finding, VN thin films were sputtered on platinum current collectors, leading to a six-fold reduction in the characteristic time associated with charge/discharge of the current collectors/electrode material. This underscores the importance of using current collectors even for highly conductive electrode materials.
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hal-04703573 , version 1 (20-09-2024)
hal-04703573 , version 2 (23-09-2024)

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Allan Lebreton, Jérémy Barbé, Christophe Lethien, Jonathan N Coleman, Thierry Brousse. Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Thickness. Journal of The Electrochemical Society, 2024, 171 (9), pp.090513. ⟨10.1149/1945-7111/ad75be⟩. ⟨hal-04703573v2⟩
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