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Article Dans Une Revue Diamond and Related Materials Année : 2024

Thermal catalytic etching of diamond by double-metal layers

Résumé

We introduce a novel technique for thermal catalytic etching of single-crystal diamond under hydrogen atmosphere using a double-metal layer consisting of two different metallic thin films. Surface phenomena, catalytic activity, hydrogen pressure dependence and etch rates in several double-metal layer configurations were investigated. We observe that etching with an optimized thickness ratio of Ni/Pd films increases the etch rate by a factor up to 11 compared to etching with a single-metal layer Ni film. The proposed double-metal layer technique enhances hydrogen absorption, which contributes to an increased etch rate of the process, as compared to conventional single-metal layer thermal catalytic etching. Moreover, the etched pattern shows smooth (111) plane sidewalls and flat (100) step-terrace bottom features.
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Dates et versions

hal-04606937 , version 1 (15-07-2024)

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D.D. Tran, C. Mannequin, M. Bonvalot, A. Traoré, H. Mariette, et al.. Thermal catalytic etching of diamond by double-metal layers. Diamond and Related Materials, 2024, 145, pp.111075. ⟨10.1016/j.diamond.2024.111075⟩. ⟨hal-04606937⟩
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