Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer - Archive ouverte HAL
Communication Dans Un Congrès Année : 2022

Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer

Corinne Gablin
Alexandre Téolis
Thierry Delair
Fichier non déposé

Dates et versions

hal-04151134 , version 1 (04-07-2023)

Identifiants

  • HAL Id : hal-04151134 , version 1

Citer

Olha Sysova, Paule Durin, Corinne Gablin, Didier Léonard, Alexandre Téolis, et al.. Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer. JNTE, Nov 2022, Besancon, France, France. ⟨hal-04151134⟩
24 Consultations
0 Téléchargements

Partager

More