Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2022

Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer

Corinne Gablin
Alexandre Téolis
Thierry Delair
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Dates et versions

hal-04151134 , version 1 (04-07-2023)

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  • HAL Id : hal-04151134 , version 1

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Olha Sysova, Paule Durin, Corinne Gablin, Didier Léonard, Alexandre Téolis, et al.. Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer. JNTE, Nov 2022, Besancon, France, France. ⟨hal-04151134⟩
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