ToF-SIMS characterization of chitosan as water developable 193 nm photolithography resist for green micro-nanopatterning - Archive ouverte HAL
Communication Dans Un Congrès Année : 2022

ToF-SIMS characterization of chitosan as water developable 193 nm photolithography resist for green micro-nanopatterning

Alexandre Teolis

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Chimie
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Dates et versions

hal-04090656 , version 1 (05-05-2023)

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  • HAL Id : hal-04090656 , version 1

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Paule Durin, Olha Sysova, Yue Guan, Corinne Gablin, Aziz Benamrouche, et al.. ToF-SIMS characterization of chitosan as water developable 193 nm photolithography resist for green micro-nanopatterning. SIMS XXIII, Sep 2022, Mineapolis, United States. ⟨hal-04090656⟩
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