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Communication Dans Un Congrès Année : 2022

Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment

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Chimie
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Dates et versions

hal-04090632 , version 1 (05-05-2023)

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  • HAL Id : hal-04090632 , version 1

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Isabelle Servin, Alexandre Teolis, Arnaud Bazin, Paule Durin, Olha Sysova, et al.. Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment. MNE 2022, Sep 2022, Louvain La Neuve, Belgium. ⟨hal-04090632⟩
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