Influence of NH3/SiH4 ratio on amorphous silicon nitride coatings deposited with Ar/NH3/SiH4 homogeneous DBD - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2008

Influence of NH3/SiH4 ratio on amorphous silicon nitride coatings deposited with Ar/NH3/SiH4 homogeneous DBD

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Plasmas
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hal-03988374 , version 1 (14-02-2023)

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  • HAL Id : hal-03988374 , version 1

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J. Larrieu, S. Pouliquen, P. Lecouvreur, S. Quoizola, Nicolas Naudé, et al.. Influence of NH3/SiH4 ratio on amorphous silicon nitride coatings deposited with Ar/NH3/SiH4 homogeneous DBD. HAKONE XI: 11th International Symposium on High Pressure Low Temperature Plasma Chemistry, Ile d’Oléron, France., 2008, Ile d’Oléron, France. ⟨hal-03988374⟩
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