Conference Papers Year : 2012

Using a two step plasma etching process for diamond power devices

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hal-03966086 , version 1 (31-01-2023)

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  • HAL Id : hal-03966086 , version 1

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F. Thion, K. Isoird, Dominique Planson, Marie-Laure Locatelli, Henri Schneider, et al.. Using a two step plasma etching process for diamond power devices. International Conference on Diamond and Carbon Materials Granada, SPAIN, 2012, Granada, Spain. ⟨hal-03966086⟩
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