Low-Frequency Noise Assessment of Silicon Passivated Ge pMOSFETs With TiN/TaN/ $\hbox{HfO}_{2}$ Gate Stack - Archive ouverte HAL Access content directly
Journal Articles IEEE Electron Device Letters Year : 2007

Low-Frequency Noise Assessment of Silicon Passivated Ge pMOSFETs With TiN/TaN/ $\hbox{HfO}_{2}$ Gate Stack

W. Guo
  • Function : Author
G. Nicholas
  • Function : Author
B. Kaczer
  • Function : Author
R. Todi
  • Function : Author
B. de Jaeger
  • Function : Author
C. Claeys
  • Function : Author
A. Mercha
  • Function : Author
E. Simoen
  • Function : Author
B. Cretu
J.-M. Routoure
  • Function : Author
R. Carin
  • Function : Author
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hal-03784663 , version 1 (23-09-2022)

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W. Guo, G. Nicholas, B. Kaczer, R. Todi, B. de Jaeger, et al.. Low-Frequency Noise Assessment of Silicon Passivated Ge pMOSFETs With TiN/TaN/ $\hbox{HfO}_{2}$ Gate Stack. IEEE Electron Device Letters, 2007, 28 (4), pp.288-291. ⟨10.1109/LED.2007.891797⟩. ⟨hal-03784663⟩
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