Journal Articles
IEEE Electron Device Letters
Year : 2007
Bogdan Cretu : Connect in order to contact the contributor
https://hal.science/hal-03784663
Submitted on : Friday, September 23, 2022-11:27:11 AM
Last modification on : Wednesday, March 20, 2024-4:20:04 PM
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W. Guo, G. Nicholas, B. Kaczer, R. Todi, B. de Jaeger, et al.. Low-Frequency Noise Assessment of Silicon Passivated Ge pMOSFETs With TiN/TaN/ $\hbox{HfO}_{2}$ Gate Stack. IEEE Electron Device Letters, 2007, 28 (4), pp.288-291. ⟨10.1109/LED.2007.891797⟩. ⟨hal-03784663⟩
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