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Communication Dans Un Congrès Année : 2021

Thorough investigation of low frequency noise mechanisms in AlGaN/GaN and Al$_2$O$_3$/GaN HEMTs

Résumé

This paper investigates the AlGaN/GaN and Al2O3/GaN interface quality on GaN MIS-HEMT using low frequency noise (LFN) measurements. To address the issue of noise in the access resistance, we have also tested "non-gated" 2DEG devices. The LFN has a 1/f-like behaviour caused by trapping/de-trapping processes which has been well described by carrier number fluctuations (CNF) and correlated mobility fluctuation (CMF) models. The border trap density extracted in optimised devices is better than previously reported GaN data and close to silicon CMOS results. Finally, a noise model for GaN-HEMT with recessed MIS gate including a 2DEG access resistance noise source is proposed.
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Dates et versions

hal-03762149 , version 1 (26-08-2022)

Identifiants

Citer

R. Kom Kammeugne, Christoforos Theodorou, C. Leroux, X. Mescot, L. Vauche, et al.. Thorough investigation of low frequency noise mechanisms in AlGaN/GaN and Al$_2$O$_3$/GaN HEMTs. IEDM2021 - IEEE International Electron Devices Meeting, Dec 2021, San Francisco, United States. pp.39.4.1-39.4.4, ⟨10.1109/IEDM19574.2021.9720522⟩. ⟨hal-03762149⟩
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