Mass spectrometry as a tool study CVD process
Résumé
Mass spectrometry as a tool study CVD process. Application of two mass spectrometric (MS) techniques to study chemical vapour deposition from organometallic precursors is described. CpCuPEt3 (Cp = η5-C5H5, Et =C2H5) was used as a model precursor in this work.
Domaines
MatériauxOrigine | Fichiers produits par l'(les) auteur(s) |
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