Multiple Magnetoionic Regimes in Ta/Co20Fe60B20/ HfO2 - Archive ouverte HAL
Article Dans Une Revue Physical Review Applied Année : 2021

Multiple Magnetoionic Regimes in Ta/Co20Fe60B20/ HfO2

Résumé

In Ta/CoFeB/HfO2 stacks a gate voltage drives, in a nonvolatile way, the system from an underoxidized state exhibiting in-plane anisotropy (IPA) to an optimum oxidation level resulting in perpendicular anisotropy (PMA) and further into an overoxidized state with IPA. The IPA → PMA regime is found to be significantly faster than the PMA → IPA regime, while only the latter shows full reversibility under the same gate voltages. The effective damping parameter also shows a marked dependence with gate voltage in the IPA → PMA regime, going from 0.029 to 0.012, and only a modest increase to 0.014 in the PMA → IPA regime. The existence of two magneto-ionic regimes has been linked to a difference in the chemical environment of the anchoring points of oxygen species added to underoxidized or overoxidized layers. Our results show that multiple magneto-ionic regimes can exist in a single device and that their characterization is of great importance for the design of high performance spintronics devices.
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Dates et versions

hal-03310930 , version 1 (30-07-2021)

Identifiants

Citer

R. Pachat, D. Ourdani, J. W. van Der Jagt, M.-A. Syskaki, A. Di Pietro, et al.. Multiple Magnetoionic Regimes in Ta/Co20Fe60B20/ HfO2. Physical Review Applied, 2021, 15 (6), pp.064055. ⟨10.1103/PhysRevApplied.15.064055⟩. ⟨hal-03310930⟩
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