Controlling refractive index in AlN films by texture and crystallinity manipulation
Résumé
Highly textured polycrystalline aluminum nitride (c-AlN) thin films with hexagonal wurtzite structure have been prepared by direct current reactive magnetron sputtering (DC) of pure aluminum using different compositions of the gas phase and different substrate temperatures.
Domaines
MatériauxOrigine | Fichiers produits par l'(les) auteur(s) |
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