Computational-friendly analytical model of electrical current pulse pattern in a spark plasma sintering device - Archive ouverte HAL
Article Dans Une Revue Applied Mathematical Modelling Année : 2019

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hal-02401828 , version 1 (10-12-2019)

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Fabien Courrèges, G. Antou, J. Diatta, M. Georges, Nicolas Pradeilles, et al.. Computational-friendly analytical model of electrical current pulse pattern in a spark plasma sintering device. Applied Mathematical Modelling, 2019, 66, pp.628-642. ⟨10.1016/j.apm.2018.10.001⟩. ⟨hal-02401828⟩
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