Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Plasma Sources Science and Technology Année : 2018

Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode

G Fischer
  • Fonction : Auteur
E Drahi
  • Fonction : Auteur
E Johnson
Fichier non déposé

Dates et versions

hal-02391062 , version 1 (03-12-2019)

Identifiants

Citer

G Fischer, K. Ouaras, E Drahi, B. Bruneau, E Johnson. Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode. Plasma Sources Science and Technology, 2018, 27 (7), pp.074003. ⟨10.1088/1361-6595/aaca05⟩. ⟨hal-02391062⟩
20 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More