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Communication Dans Un Congrès Année : 2014

Selective dry etching of titanium nitride nanostructures with chlorine-based inductively coupled plasma

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hal-02339986 , version 1 (30-10-2019)

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  • HAL Id : hal-02339986 , version 1

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Bruno Lee Sang, Marie-Josee Gour, Maxime Darnon, Serge Ecoffey, Abdelatif Jaouad, et al.. Selective dry etching of titanium nitride nanostructures with chlorine-based inductively coupled plasma. 40th Micro and Nano Engineering Conference, Sep 2014, Lausanne, Switzerland. ⟨hal-02339986⟩
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