Carrier scattering by workfunction fluctuations and interface dipoles in high-K/metal gate stacks - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2016
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hal-02143475 , version 1 (29-05-2019)

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Zaiping Zeng, Francois Triozon, Yann-Michel Niquet. Carrier scattering by workfunction fluctuations and interface dipoles in high-K/metal gate stacks. 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2016, Nuremberg, France. pp.369-372. ⟨hal-02143475⟩
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