Journal Articles
Surface and Coatings Technology
Year : 2014
Florent Tétard : Connect in order to contact the contributor
https://hal.science/hal-02095957
Submitted on : Wednesday, April 10, 2019-11:55:37 PM
Last modification on : Monday, March 27, 2023-9:34:31 AM
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- HAL Id : hal-02095957 , version 1
- DOI : 10.1016/j.surfcoat.2013.10.067
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Florent Tetard, G. Sánchez, P. Tristant, C. Dublanche-Tixier, F. Tétard, et al.. Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition. Surface and Coatings Technology, 2014, 256, pp.3-8. ⟨10.1016/j.surfcoat.2013.10.067⟩. ⟨hal-02095957⟩
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