A comparative study of the interfacial roughness correlation and propagation in Mo/Si multilayers deposited using RF-magnetron sputtering on silicon, ule and zerodur substrates - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physics: Condensed Matter Année : 2002

A comparative study of the interfacial roughness correlation and propagation in Mo/Si multilayers deposited using RF-magnetron sputtering on silicon, ule and zerodur substrates

K Faik
  • Fonction : Auteur
B Vidal
  • Fonction : Auteur

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Matériaux
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Dates et versions

hal-01951278 , version 1 (11-12-2018)

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Magali Putero, K Faik, B Vidal. A comparative study of the interfacial roughness correlation and propagation in Mo/Si multilayers deposited using RF-magnetron sputtering on silicon, ule and zerodur substrates. Journal of Physics: Condensed Matter, 2002, 14 (39), pp.8955-8968. ⟨10.1088/0953-8984/14/39/305⟩. ⟨hal-01951278⟩
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