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Article Dans Une Revue Microelectronic Engineering Année : 2007

Development of robust interfaces based on crystalline γ-Al2O3(001) for subsequent deposition of amorphous high-κ oxides

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hal-01939913 , version 1 (29-11-2018)

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  • HAL Id : hal-01939913 , version 1

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C. Merckling, M. El-Kazzi, L. Becerra, L. Largeau, G. Patriarche, et al.. Development of robust interfaces based on crystalline γ-Al2O3(001) for subsequent deposition of amorphous high-κ oxides. Microelectronic Engineering, 2007, 84 (9-10), pp.2243-2246. ⟨hal-01939913⟩
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