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Poster De Conférence Année : 2017

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry

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hal-01710320 , version 1 (15-02-2018)

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  • HAL Id : hal-01710320 , version 1

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Jean-Pierre Landesman, Daniel T Cassidy, Erwine Pargon, Christophe Levallois, Merwan Mokhtari, et al.. Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry. 18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017), Aug 2017, Waterloo, Canada. ⟨hal-01710320⟩
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