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Article Dans Une Revue Thin Solid Films Année : 2010

X-ray diffraction analysis of thermally-induced stress relaxation in ZnO films deposited by magnetron sputtering on (100) Si substrates

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hal-01442841 , version 1 (21-01-2017)

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F. Conchon, P. O. Renault, P. Goudeau, E. Le Bourhis, E. Sondergard, et al.. X-ray diffraction analysis of thermally-induced stress relaxation in ZnO films deposited by magnetron sputtering on (100) Si substrates. Thin Solid Films, 2010, 518 (18), pp.5237 - 5241. ⟨10.1016/j.tsf.2010.04.037⟩. ⟨hal-01442841⟩
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