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Article Dans Une Revue Polymer Année : 2015

Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining

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hal-01228427 , version 1 (13-11-2015)

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Alexane Vital, Marylène Vayer, Christophe Sinturel, Thomas Tillocher, Philippe Lefaucheux, et al.. Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining. Polymer, 2015, 76, pp.123-130. ⟨10.1016/j.polymer.2015.08.062⟩. ⟨hal-01228427⟩
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