Highly Ordered Nanoporous Films from Supramolecular Diblock Copolymers with Hydrogen-Bonding Junctions - Archive ouverte HAL
Article Dans Une Revue Angewandte Chemie Année : 2015

Highly Ordered Nanoporous Films from Supramolecular Diblock Copolymers with Hydrogen-Bonding Junctions

Damien Montarnal
Nicolas Delbosc
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Yingdong Luo
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Craig J. Hawker
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Eric Drockenmuller
Julien Bernard

Résumé

We designed efficient precursors that combine complementary associative groups with exceptional binding affinities and thiocarbonylthio moieties enabling precise RAFT polymerization. Well defined PS and PMMA supramolecular polymers with molecular weights up to 30 kgmol(-1) are synthesized and shown to form highly stable supramolecular diblock copolymers (BCPs) when mixed, in non-polar solvents or in the bulk. Hierarchical self-assembly of such supramolecular BCPs by thermal annealing affords morphologies with excellent lateral order, comparable to features expected from covalent diblock copolymer analogues. Simple washing of the resulting materials with protic solvents disrupts the supramolecular association and selectively dissolves one polymer, affording a straightforward process for preparing well-ordered nanoporous materials without resorting to crosslinking or invasive chemical degradations.

Dates et versions

hal-01221618 , version 1 (28-10-2015)

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Citer

Damien Montarnal, Nicolas Delbosc, Cécile Chamignon, Marie-Alice Virolleaud, Yingdong Luo, et al.. Highly Ordered Nanoporous Films from Supramolecular Diblock Copolymers with Hydrogen-Bonding Junctions. Angewandte Chemie, 2015, 54 (38), pp.11117-21. ⟨10.1002/anie.201504838⟩. ⟨hal-01221618⟩
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