Comparison of Radio Frequency Physical Vapor Deposition target material used for LaOx cap layer deposition in 32nm - Archive ouverte HAL
Communication Dans Un Congrès Année : 2010

Comparison of Radio Frequency Physical Vapor Deposition target material used for LaOx cap layer deposition in 32nm

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hal-00604574 , version 1 (29-06-2011)

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  • HAL Id : hal-00604574 , version 1

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S. Baudot, P. Caubet, M. Grégoire, R. A. Bianchi, R. Pantel, et al.. Comparison of Radio Frequency Physical Vapor Deposition target material used for LaOx cap layer deposition in 32nm. Int. Conf. materials for advanced metallization, MAM 2010, 2010, Malines, Belgium. ⟨hal-00604574⟩
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