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Article Dans Une Revue Surface Science : A Journal Devoted to the Physics and Chemistry of Interfaces Année : 2004

Structure and growth of titanium buffer layers on Al2O3(0001)

Résumé

The structure of titanium films on \alpha - Al2O3(0001) surfaces at room temperature was investigated through in situ reflection high energy electron diffraction (RHEED). The \alpha-phase of titanium was observed to grow with the Ti(0001) || Al2O3(0001), Ti[1100] || Al2O3[2110] and Ti[1010] || Al2O3[1100] epitaxy. For up to 6 nm thick films, an other structure was found to coexist with \alpha-Ti. Its presence has dramatic consequences for the wetting of silver, which partly explains the nontrivial buffer effect of titanium at the silver/alumina interface. From the RHEED data, the extra structure is assigned to the high-pressure hexagonal \omega-Ti phase. This is supported by tight-binding total energy calculations that demonstrate that the \omega phase could actually be stabilized by the \alpha - Al2O3(0001) substrate.
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Dates et versions

hal-00001676 , version 1 (10-06-2004)

Identifiants

Citer

E. Sondergard, O. Kerjan, Cyrille Barreteau, J. Jupille. Structure and growth of titanium buffer layers on Al2O3(0001). Surface Science : A Journal Devoted to the Physics and Chemistry of Interfaces, 2004, 559, pp.131-140. ⟨10.1016/j.susc.2004.03.072⟩. ⟨hal-00001676⟩
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