Chemical diffusion for CoO and Cu2O deduced from creep transitories
Résumé
The analysis of creep transitories after a change in oxygen partial pressure, allowed us to determine chemical diffusion coefficients for CoO and Cu 2O, single- and polycrystals. The rate of equilibration of point defect concentrations is similar for all defects. Grain boundaries do not seem to accelerate the process.
Origine | Accord explicite pour ce dépôt |
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