PYROLYTIC DECOMPOSITION OF SILANE ON LASER-IRRADIATED SILICA SUBSTRATES
Résumé
Microstructures were produced on Si-coated or uncoated silica substrates via cw CO2 laser-induced decomposition of silane. The deposition rate of Si dots having a Gaussian profile was found to be proportional to the SiH4 pressure and linearly dependent on the laser power or laser-induced surface temperature. At low SiH4 pressures (below 1 Torr) and above 1050°C, ring-shaped Si dots were deposited on silica substrates and SiO2 was etched at the center of the laser spot. The reaction mechanisms of the deposition of silicon and etching of silica are discussed in this paper.
Domaines
Articles anciens
Origine : Accord explicite pour ce dépôt
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