Communication Dans Un Congrès Année : 2025

Aluminum Nanoparticles For Photobleaching Resistance Of Quantum Dots In Solution

Résumé

We investigated aluminum nanoparticles (2–20 nm) synthesized via ion reduction in alkane solvents. Extinction spectroscopy revealed UV-range plasmon resonances matching Mie theory. These nanoparticles enhanced quantum dot emission by 1.75 times and reduced photobleaching, absorbing emitted light. They hold promise as building blocks for nanophotonics and protecting emitters from degradation.

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hal-05400794 , version 1 (05-12-2025)

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  • HAL Id : hal-05400794 , version 1

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Jérôme Plain, Jérôme Plain, Théo Duarte, Silvère Schuermans, Thomas Lerond, et al.. Aluminum Nanoparticles For Photobleaching Resistance Of Quantum Dots In Solution. The 15th International Conference on Metamaterials, Photonic Crystals and Plasmonics, Jul 2025, Torremolinos, Málaga (Spain), Spain. ⟨hal-05400794⟩
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