Article Dans Une Revue Nanoscale Année : 2025

Multi-head spatial atomic layer deposition: a robust approach for precise doping and nanolaminate fabrication in open-air environments

Résumé

Multi-head SALD enables the deposition of sharp nanolaminate layers under ambient conditions by isolating precursors, preventing intermixing, and enabling precise control of thickness for scalable, high-throughput multilayer film production.

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Dates et versions

hal-05249509 , version 1 (11-09-2025)

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Hayri Okcu, Martin Ignacio Broens, Vijaya Shanthi Paul Raj, Pia Javiera Vasquez Rivera, Gustavo Ardila, et al.. Multi-head spatial atomic layer deposition: a robust approach for precise doping and nanolaminate fabrication in open-air environments. Nanoscale, 2025, 17 (30), pp.17544-17558. ⟨10.1039/D5NR01812A⟩. ⟨hal-05249509⟩
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